Vacuum Range:1 x 10^-2 to 1 Torr
Maximum Flow Rate:500 L/min @ 1 Torr
Power Consumption:2 kW
Operating Temperature:-20°C to +50°C
Noise Level:55 dB(A)
Vacuum Pumps Type:Dry Scroll
Vacuum Chamber Compatibility:ISO 21460 compatible
The Edwards D37232000 is engineered to deliver unparalleled performance in semiconductor manufacturing environments, offering a compact design that integrates seamlessly into existing production lines. Its dry scroll technology ensures minimal maintenance requirements and extends operational lifespan, reducing downtime and enhancing productivity.
With a vacuum range from 0.01 mbar to 100 mbar, the pump is capable of achieving the precise vacuum levels required for various stages of semiconductor processing, including etching, deposition, and cleaning. This precision control leads to higher yield and improved device performance.
Featuring a robust and reliable motor with a maximum speed of 2,500 RPM and a power consumption of 1.5 kW, the D37232000 provides consistent and stable operation under demanding conditions. Its low noise level of 65 dB(A) minimizes environmental disturbances, creating an optimal working environment for operators.
Engineered for durability, the pump is designed to withstand the rigorous conditions of semiconductor manufacturing facilities, boasting a temperature range of -10°C to +45°C and an extended maintenance interval of every 2,000 hours of operation. This ensures minimal intervention and maximum uptime, allowing manufacturers to focus on core operations without concern for equipment maintenance.
Our team of experts offers comprehensive support throughout the lifecycle of the Edwards D37232000, providing training, installation guidance, and after-sales services to ensure smooth integration and optimal performance. Trust in our commitment to excellence and reliability, making the Edwards D37232000 your go-to choice for high-quality vacuum solutions in semiconductor manufacturing.
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